Capabilities
Microscopy
Near infrared and visible Raman/fluorescence platforms (Dual-mode operation: line-scan confocal microspectroscopy or conventional macrospectroscopy)(Olympus)
Microfluidics
Ultrafast femtosecond laser (Newport/SpectraPhysics Mai Tai) + Optical parametric oscillator (OPO, Inspire)
Optical delay line
DMD SLM-based stimulated Raman scattering (SRS) imaging
Acoustic optical modulator (AOM)
Lock-in amplifier
Various XYZ motorized and piezo scan stages
Various galvo scan mirrors
Various grating spectrographs (Princeton/Acton)
Various scientific CCD cameras (TE cooled to -70C)
Intensified CCD camera (1 nanosecond gate, Princeton)
EMCCD camera (Princeton)
Two-photon imaging
Laser ablation micro machining
Two-photon laser polymerization and lithography
UV/VIS/NIR spectrophotometer
UV-VIS-NIR (250-3300nm. Shimazu) with reflectance unit and integrating sphere
Chemometrics
Multivariate ordinary least squares, principal component analysis (PCA), partial least squares (PLS).Nanophtonics and Nanoplasmonics
Finite difference time domain (FDTD) simulationBiomedical optics
Ray tracingMonte Carlo simulation of light propagation in biological tissue
Mie scattering calculation
Nanofabrication
Proximity ion/neutral beam lithographyContact lithography
Soft lithography
DC (100mTorr) and Magnetron (4-100mTorr) sputtering of Au, Ag, SiO2, etc
PECVD conformal pPMMA and DLC
Plasma etching of Si, SiO2, etc.
Wet etch: Au, SiO2.
Scanning electron microscope
User of UH Cleanroom
E-Beam lithographyDRIE